

Qhov tseeb hais tias cov thev naus laus zis thev naus laus zis muaj qhov ua tau zoo tshaj plaws hauv kev lag luam kev lag luam yog ua raws li N hom Cz-Si wafer yog kev tawm tsam ntawm vim li cas n-hom wafers yog cov khoom haum tshaj plaws rau kev ua haujlwm siab hnub ci hlwb. Nkag mus ntxiv kom paub meej, muaj qee qhov kev mob ntawm lub cev rau kev ua tiav ntawm N hom tiv thaiv P hom, qhov tseem ceeb tshaj plaws yog:
vim tsis muaj boron, tsis muaj ib qho teeb pom kev cuam tshuam dab tsi (LID) tshwm sim hauv p-hom Si wafers, vim boron-oxygen complexes
raws li N hom Si tsis rhiab me ntsis rau cov hlau tsis zoo, feem ntau cov tsheb thauj mus los feem ntau tsis ntev ntev hauv n-hom Cz-Si yog siab dua piv rau p-hom Cz-Si
N hom Si yog qhov tsis tshua muaj kev cuam tshuam zoo thaum lub sijhawm ua cov cua kub ceev xws li B-diffusion.
1 Cov khoom muaj zog
Cov cuab yeej | Specification | Kev Soj Ntsuam Cov Qauv |
Txoj kev loj hlob | CZ | |
Crystallinity | Monocrystalline | Qhov Tshaj Tawm Etch Txuj Ci(ASTM F47-88) |
Kev Coj Yam | N-hom | Napson EC-80TPN |
Dopant | Phus Thas | - |
Cov pa oxygen [Oi] | ≦8E+17 ntawm / cm3 | FTIR (ASTM F121-83) |
Cov pa roj carbon concentration [Cs] | ≦5E+16 ntawm / cm3 | FTIR (ASTM F123-91) |
Etch qhov ceev (dislocation ntom) | ≦500 cm-3 | Qhov Tshaj Tawm Etch Txuj Ci(ASTM F47-88) |
Kev taw qhia sab npoo | & lt; 100> ± 3 ° | Kev Siv Tshuab Xaj Hluav Taws Xob (ASTM F26-1987) |
Qhia ntawm pseudo square sab | & lt; 010> ;,< 001=""> ± 3 ° | Kev Siv Tshuab Xaj Hluav Taws Xob (ASTM F26-1987) |
2 Cov khoom hluav taws xob
Cov cuab yeej | Specification | Kev Soj Ntsuam Cov Qauv |
Cov ua tau tiv | 0.2-2.0 Ω.cm 0.5-3.5 Ω.cm 1.0-7.0 Ω.cm 1.5-12 Ω.cm Lwm qhov tawm tsam | Wafer xyuas system |
MCLT (haiv neeg tsawg cov neeg nqa khoom lub neej) | ≧1000 μs (Kev tawm tsam> 1Ωcm) | Kev ua si thoob hloov |
3 Ntsuas
Cov cuab yeej | Specification | Kev Soj Ntsuam Cov Qauv |
Ntsuas | Pseudo square | |
Bevel ntug cov duab | Hloov | |
Wafer loj (Sab ntev * sab ntev * taub) | M0: 156*156*ϕ210 hli M1: 156.75*156.75* ϕ205 hli M2: 156.75*156.75* ϕ210 hli | Wafer xyuas system |
Lub kaum sab xis ntawm ib sab uas nyob ib sab | 90±3° | Wafer xyuas system |

Cim npe nrov: N Hom 156.75mm Monocrystalline Hnub Ci Wafer, Tuam Tshoj, cov chaw muag khoom, chaw tsim khoom, Hoobkas, ua nyob rau hauv Suav teb











