Tau qhov twg los: atomiclimits.com
Muaj ntau yam uas yuav tau hais (thiab piav qhia) txog qhov sawv ntawm PERC thiab nws cov txheej txheem tsim khoom lag luam thiab qhov no yog ib yam dab tsi kuv yuav tawm rau lwm qhov ntxiv blog rau tam sim no. Tab sis ib qho tsis tseem ceeb uas tseem ceeb rau hauv tsab ntawv ceeb toom:Tus yuam sij rau PERC kev tsim yog tom qab passivation, hos cov khoom tsis sib haum ntawm kev xaiv rau lub hom phiaj no yog txhuas oxide, uas tuaj yeem tso nyiaj siv PECVD tshuab, zoo-paub los ntawm kev thov silicon nitride, lossis Atomic Layer Deposition (ALD) cov cuab yeej”. Kuv xav txuas mus rau qhov no raws li peb cov kev tshawb fawb ntawm Eindhoven University of Technology tau pab txhawb ntau heev rau kev tshawb nrhiav cov txheej txheej saum npoo los ntawm Al2O3(ALD thiab PECVD), mus rau kev tshawb xyuas ntawm cov hauv paus ntsiab lus thiab cov khoom muaj peev xwm ua lub siab-siab ntawm kev ua kom lub ntsej muag saum npoo av, nrog rau ua qauv qhia ntawm Al2O3hauv cov khoom siv hluav taws xob hauv hnub ci.
Kuv xav txog kev hais txog qee qhov tseem ceeb ntawm Al2O3passivation nto thiab nws cov txheej txheem deposition tab sis tom qab ntawd kuv nco qab tias kuv tau sau ntau yam ntawm cov xyoo 2011 thaum npaj daim ntawv sablaj rau 21st NREL Rhiav ntawm Crystalline Silicon Solar Cell& Cov Qauv: Cov Khoom Siv thiab Txheej Txheem Kev Txhim Kho hauv Breckenridge Colorado xyoo 2011. Kuv raug caw tuaj koom lub rooj sib tham no (coj qhov chaw txhua xyoo, saibhttps://siliconworkshop.com) vim tias peb kev ua haujlwm ntawm Al2O3tau nyiam ntau ntawm lub sijhawm ntawd. Rov nyeem tsab ntawv xov xwm sablaj, Kuv pom tias ntau qhov tau piav qhia hauv daim ntawv tseem khaws cia thiab tau ceev faj zoo heev. Yog li ntawd kuv tau txiav txim siab luam cov ntawv ntawm tag nrho daim ntawv hauv qab no thiab kom ntxiv qee cov lus me me rau nws. Los ntawm txoj kev, daim ntawv ua raws 10 lo lus nug uas nws cov lus teb yuav tsum tau muab lub tswv yim zoo txog "lub zeem muag rau kev siv Al2O3rau high efficiency hnub ci hlwb”Qhov no yog lub npe ntawm cov ntawv.
Kuv xav ntxiv ntawm no tias Kuv kuj tau muab kev sib tham hauv lub tsev25thEuropean PV Hnub Ci Zog Lub Rooj Sib Tham thiab Kev Ua Yeeb Yamhauv Valencia hauv 2010. Lub sijhawm no yog lub sijhawm uas muaj qhov txaus siab Al2O3hauv lub chaw tsim hluav taws xob xov tooj ntawm hnub ci tiag tiag tau pib coj tawm. Kuv kaw qhov kev nthuav qhia no thiab koj tuaj yeem mloog nws rov qabnoCov. Nws yuav tsum muab rau koj lub ntsiab lus ceev hais txog txhua yam hais txog Al2O3hauv 20 min. Ntxiv mus, Kuv xav nco ntsoov tias ntau ntau cov ntaub ntawv muaj nyob hauv daim ntawv txheeb xyuas uas kuv tus qub PhD thiab kuv tau sau hauv xyoo 2012:Cov xwm txheej thiab cov kev cia siab ntawm Al2O3-based deg passivation schemes rau silicon hnub ci hlwb(txuas)). Yog tias koj koom nrog lossis xav Al2O3rau cov hnub ci hlwb, qhov no tej zaum yuav tsum tau nyeem.
Thaum kawg kuv xav hais tias muaj ntau yam tau tshwm sim txij hnub no tab sis raws li tau hais, qhov no yuav raug hais rau hauv lwm tus ncej blog sai sai!
Cov ntaub ntawv sib tham 21st Rhiav ntawm Crystalline Silicon Solar Cell& Cov Qauv: Cov Khoom Siv thiab Cov Txheej Txheem - Breckenridge Colorado - 2011 *
Txheeb xyuas cov zeem cia rau kev siv Al2O3rau high-efficiency hnub ci hlwb
Al2O3yog cov khoom siv uas tau nce sai heev hauv cov koob npe hauv xyoo dhau los ua nyias zaj duab xis passivation khoom rau c-Si photovoltaics (PV). Hauv no muaj kaum nqe lus nug yuav hais daws raws li yuav muaj nyob hauv zej zog xov tooj ntawm hnub ci.
1) - Hla passivation los ntawm Al2O3, Dab tsi yog dab neeg?
Twb tau nyob rau hauv 1989 Hezel thiab Jaeger tshaj tawm txog passivation yam ntxwv ntawm Al2O3kev ua yeeb yaj kiab thaum lub sijhawm npaj los ntawm pyrolysis [1]. Txawm hais tias daim ntawv no tau tshaj tawm txog cov cuab yeej nthuav dav ntawm cov khoom hauv nqe ntawm qhov chaw hla ntawm c-Si (piv txwv li, muaj qhov siab ntawm qhov tsis tsub nqi tsis zoo), muaj kev txaus siab ntxiv rau a-SiNx: H thin cov yeeb yaj kiab thaum lub sijhawm ntawd thiab cov khoom siv nws qhov tseem ceeb tsis pom zoo hauv zej zog PV. Qhov no hloov txawm li cas los xij nyob ib puag ncig 2005 thaum tshawb nrhiav pawg ntawm IMEC [2] thiab Eindhoven University of Technology (TU / e) [3] qhia tias Al2O3cov yeeb yaj kiab npaj los ntawm atomic txheej deposition (ALD) - ib hom ntawv ntawm kev tso pa vapor deposition (CVD) [4] - ua rau kom zoo heev ntawm qib passivation ntawmn-ibpe thiabp-ibpe c-Si. Tom qab cov ntawv ceeb toom thawj zaug no txaus siab rau Al2O3loj hlob sai, tshwj xeeb tshaj yog thaum nws tau pom tias Al2O3kuj ua rau ib tug passivation zoo heev ntawmp+-thov cov chaw [5] thiab tom qab kev tshaj tawm ntawm kev ua haujlwm ntawm cov hnub ci hlwb uas Al2O3tau siv rau passivate nram qab thiab sab pem hauv ntej sab ntawmp-type [6] thiabn-type [7] lub hnub ci hlwb.
2) - Dab tsi yog cov khoom siv theem pib ntawm Al2O3films siv rau Si passivation?
Al2O3yog qhov sib txawv loj dav (~ 8.8 eV rau cov khoom siv loj) dielectric uas muaj nyob rau hauv ntau cov ntaub ntawv crystalline. Txawm li cas los xij, rau passivation txheej amorphous Al2O3cov yeeb yaj kiab tau siv nrog cov khoom me me ntawm bandgap (~ 6.4 eV) thiab nrog rau qhov ntsuas qhov ntsuas ntawm ~ 1.65 ntawm photon zog ntawm 2eV. Cov yeeb yaj kiab yog vim li ntawd kom pom pob tshab tshaj li thaj tsam wavelength ntawm kev txaus siab rau cov hnub ci hlwb. Cov yeeb yaj kiab feem ntau yog li ntawm stoichiometric ([O] / [Al] piv=~ 1.5) txawm hais tias tuaj yeem muaj me ntsis ntawm O hauv zaj duab xis. Thaum npaj los ntawm CVD-based cov tswv yim, cov yeeb yaj kiab ua yeeb yaj kiab kuj tseem muaj cov ntsiab lus tsis muaj hydrogen (feem ntau 2-3 ntawm.%) Thiab qhov hydrogen no feem ntau sib raug zoo rau (tshaj) O li –OH pawg. Nws tau txawm li cas los xij tau pom hais tias qhov ua tau zoo heev passivation tsis cia siab rau lub Al2O3cov khoom xws li stoichiometry thiab cov khoom siv purity [8]. Cov ntsiab lus hydrogen ntawm Al2O3cov yeeb yaj kiab txawm li cas los xij pom tias nws tseem ceeb heev rau kev siv tshuaj lom neeg los ntawm c-Si tau los ntawm Al2O3movies. Qhov no tuav kuj rau interfacial txheej ntawm SiOx(1-2 nm tuab) uas yog (ib txwm) tsim ntawm Al2O3thiab Si thaum thov cov txheej txheem CVD-based [3,9].
Qhov refractive index n thiab extinction coefficient k ntawm 30 nm Al2O3zaj duab xis tso los ntawm ALD[10].
3) - Hom kev qhia twg tuaj yeem siv los npaj Al2O3nyias zaj duab xis?
Al2O3cov yeeb yaj kiab rau c-Si nto passivation tau xaj los ntawm kev ua kom sov thiab ntshav-pab ALD ua haujlwm Al (CH3)3txheej ceev ua ke nrog sib txawv oxidant qhov chaw (H2O, O3thiab O2ntshav) [8,11]. Plasma-txhim kho CVD (PECVD, los ntawm Al (CH3)3thiab N2O lossis CO2cov khoom sib xyaw) kuj tau ua haujlwm rau tso nyiaj Al2O3[8,12,13] raws li lub cev vapor deposition (PVD) txheej txheem ntawm kev txhuam mus [14]. Thaum ntxov (1989) Hezel thiab Jaeger siv pyrolysis ntawm Al (OiPr)3rau kev tso cai ntawm Al2O3uas yog thawj zaug soj ntsuam ntawm Al2O3-based passivation ntawm c-Si puas tau tshaj tawm [1]. Kuj sol-gel txheej txheem tau tshawb xyuas Al2O3hluavtaws rau c-Si passivation [15,16]. Hauv txhua qhov no annealing ntawm cov yeeb yaj kiab ntawm ~ 400 ºC yog tau txais txiaj ntsig los yog txawm tias xav tau kom ua tiav qib siab ntawm thaj chaw passivation.
Txawv lub tshuab hluav taws xob sib txawv rau cov cua sov ALD: (a) ib leeg-wafer reactor, (b) batch reactor, thiab hom ALD reactor. Hauv (a) thiab (b) ALD cov voj voog yog tau ua nyob rau ntawm lub sijhawm-sijhawm thiab hauv (c) ALD cov voj voog yog tau ua nyob rau hauv qhov chaw tshaj lij[17].
4) - Dab tsi ua rau Al2O3thiaj li cim rau nto passivation?
Ob qhov kev hla lub cev tuaj yeem pom tau rau Si qhov chaw. Thawj lub tshuab yog qhov kev txo qis ntawm lub xeev qhov ceevDnwsntawm Si qhov chaw saum npoo, piv txwv li, dhau ntawm qhov ua kom dhau ntawm Si dai txoj hlua khi los ntawm H atoms. Tus txheej txheem no hu ua "passivation tshuaj". Qhov txheej txheem thib ob yog qhov txo qis ntawm txoj haujlwm ntawm cov haiv neeg tsis tshua muaj nqi thauj khoom tam sim no ntawm Si saum npoo los ntawm cov chaw tsim hluav taws xob nyob sab nraud. Qhov no thiaj li hu ua "daim phiaj cuam tshuam passivation" tuaj yeem ua tiav los ntawm doping profiles lossis los ntawm kev siv nyiaj taagQftam sim no hauv ib zaj duab xis nyias tso ntawm Si. Qhov zoo tshaj plaws passivation los ntawm Al2O3feem ntau yog kev sib txuas ntawm ob lub tshuab.
Qhov tseeb ntawm Al2O3tuaj yeem muaj qhov kub siab ceev (txog 1013cm-3) ntawmtsis zootsub ua rau cov khoom tsis zoo [18]. Yuav luag txhua yam khoom siv (tshwj xeeb hauv SiO2thiab a-SiNx: H) muaj cov nqe lus them zoo thiab nyob rau tus nqi qis. Rau Al2O3tus nqi taag nyob ntawm qhov interface ntawm Al2O3thiab Lub interfacial SiOxnyob rau Si [19]. Tsis tas li ntawd, nws yog qhov tsim nyog yuav tsum nco ntsoov tias qhov ntom ntawm cov nqi sib npaug hauv Al2O3nyob ntawm tus qauv npaj ntawm Al2O3.Rau cov yeeb yaj kiab npaj los ntawm Plasma-pab ALD thiab PECVD feem ntau yog qhov siab duaQfyog pom rau ntawm cov yeeb yaj kiab npaj los ntawm thermal ALD. Nyob rau hauv tom qab rooj plaub qhov theem zoo tshaj plaws ntawm kev mob siab kawg tuaj yeem raug ntaus nqi rau tus qisDnwstheem.
Qhov thib ob qhov tseem ceeb ntawm Al2O3, ib qho kev xav uas tau txais tsawg dua cov mloog tam sim no, yog qhov tseeb ntawm Al2O3kuj ua qhov kev ua tau zoo hydrogen reservoir muab hydrogen rau Si interface thaum kho cov cua sov (thaum hais tawm thiab thaum ua haujlwm tua hluav taws). Qhov no tau tsis ntev los no tau tsim ua tiav [9] thiab piav qhia qhov tseeb tias xws li theem zoo ntawm kev siv tshuaj lom neeg tuaj yeem ua tiav los ntawm Al2O3cov yeeb yaj kiab, ib qho yog tso ncaj qha rau H-haujlwm Si lossis ntawm Si uas muaj lub SiO tsoxtxheej (piv txwv li, los ntawm PECVD lossis ALD) uas yog kis tsis zoo los ntawm nws tus kheej (piv txwv li, thaum tsis muaj Al2O3capping txheej yog thov) [20].
Npaum thim rov qab tshaj tawm Seff, maxrau ntshav-pabcuam thiab thermal ALD Al2O3films raws li kev ua haujlwm ntawm qhov nqi them corona ntom ntwm rau ntawm Al2O3Cov. Cov phiaj xwm no tau qhia tawm tias ob zaj yeeb yaj kiab muaj qhov ntsuas tsis zoo rau qhov tsis txaus tab sis nrog them tsawg dua nyob rau hauv cov qauv thermal ALD. Lub thermal ALD muaj qib siab dua ntawm cov tshuaj passivation tshuaj raws li qhia tawm los ntawm tus nqi qis ntawm Seff, maxntawm qhov taw tes thaum qhov kev them nyiaj ruaj ntseg tau them rov qab los ntawm kev them nqi corona.
Ceeb toom 2018:Cov kev tshawb fawb soj ntsuam tshiab tsis ntev los no txog qhov passivation ntawm cov tshuaj silicon los ntawm ntau cov hlau oxides tau qhia tias ntau ntawm cov hlau oxides yog qhov tsis zoo rau kev them nyiaj dielectrics, piv txwv li, HfO2, Ga2O3, TiO2, Nb2O5, thiab lwm yam.
5) - Dab tsi yog qhov ua tau zoo ntawm (muaj hom-hnub) hnub ci hlwb nrog Al2O3?
Xav txog kev muaj siab xav txog Al2O3tsis pub dhau lub zej zog PV [21,22], nws zoo li tias kev ua haujlwm ntawm cov hnub ci hlwb uas muaj Al2O3cov theem passivation raug sim ntau. Txawm li cas los xij raws li nws txhawj xeeb txog cov ntaub ntawv muaj txiaj ntsig thiab cov tswv lag luam rau PV cov tuam txhab cov txiaj ntsig ntawm cov kev ntsuas no tsis nthuav tawm lossis tsis qhia meej meej xws li. Thawj qhov tshwm sim ntawm cov hnub ci hlwb nrog Al2O3teeb txawm li cas los ntawm theem thiab tseem ceeb heev nyob rau hauv kev txaus siab ntawm PV kev lag luam. Thawj hnub ci xovtooj ntawm tes tau tshaj tawm txogp-type PERC cov hlwb hauv uas ALD Al2O3tau siv rau sab nraub qaum-passivation, raws li ib txheej thiab hauv ib pawg ua ke nrog PECVD-SiOx(kev sib koom tes ISFH - TU / e) [6]. Kev ua tau zoo tshaj plaws nyob rau hauv daim ntawv tshaj qhia no yog 20.6% thiab tom qab ua haujlwm rau cov hlwb hnub ci zoo sib xws li ntawm 21.5% tau txais [13]. Lwm qhov tseem ceeb thaum ntxov ua tiav yog qhov ua tau zoo ntawm 23.2% raun-type PERL hlwb uas ALD Al2O3ua ke nrog PECVD a-SiNx: H tau siv rau pem hauv ntej-hla kev dhau (sib koom tes Fraunhofer ISE - TU / e) [7]. Nyob rau theem tom qab kev ua tau zoo ntawm 23.5% tau tiav rau lub hnub ci hlwb [23]. Lwm cov xov tooj ntawm tes hnub ci tau qhia los ntawm ITRI [24], ECN [25] thiab University of Konstanz [26].
PERL lub xovtooj cua hnub ci nrog n-hom Si puag thiab muaj pem hauv ntej-saum passivation txheej ntawm Al2O3(30 nm) ua ke nrog a-SiNx: H (40 nm) txheej tiv thaiv tsis taus[7].
Ceeb toom 2018:Pom tseeb, qhov kev lag luam tawg ntawm Al2O3tau nyob hauv PERC thev naus laus zis.
6) - Qhov yuav tsum ua ntawm kev ua yeeb yaj kiab thiab kev ua cov ntsiab lus zoo li cas?
Ntau cov nqe lus nug kev yuav tsum raug coj los hais daws thiaj li ua tiav Al2O3hauv cov hnub ci hlwb. Cov lus teb rau cov lus nug no pom tseeb nyob ntawm lub hnub ci xov tooj ntawm tes thiab kev teeb tsa pom tau tab sis qee qhov kev nkag siab tau tau los ntawm cov kev tshawb fawb tau coj hauv ob peb xyoos dhau los. Rau ALD-tso cov zaj duab xis qhov kawg tuab tau pom tias yog 5 nm thiab 10 nm rau plasma-pab thiab thermal ALD, feem [27]. Qhov sib txawv xav pom los ntawm qhov tsawg dua qhov tseem ceeb ntawm daim teb-nyhuv passivation los ntawm thermal ALD. Qhov zoo tshaj plaws ntawm qhov tso nyiaj tau yog nyob hauv thaj tsam ntawm 150-250oC [8]. Txawm hais tias qib passivation tsis rhiab heev rau qhov kev tso tawm cov kub, qhov zoo tshaj yog tswj hwm los ntawm cov tshuaj passivation [9]. Thaum qis dua kub, Al2O3zaj duab xis ntom ntom yog tsis siab ntau dua qhov sov siab tshaj qhov Al2O3muaj cov ntsiab lus hydrogen tsawg heev. Hauv ob qho xwm txheej no, Al2O3tsis tuaj yeem muab cov hydrogen txaus rau passivate Si dangling daim ntawv cog lus ntawm qhov sib cuam tshuam (thaum muaj kev sib koom tes), vim yog vim muaj qhov tawm loj dhau ntawm qhov sib txawv ntawm hydrogen rau hauv qhov chaw nyob lossis cov chaw tso dej ntau dhau ntawm hydrogen los pib nrog. Xav txog kev sau nrog Al2O3- ib kauj ruam uas tseem ceeb rau kev ua kom lub siab passivation mus rau qhov kawg - qhov kub zoo tshaj yog nyob ib ncig ntawm 400oC [27]. Ntawm qhov kub no hydrogen txaus yog liberated los ntawm zaj duab xis. Qhov tseeb tias hydrogen ntawm zaj duab xis txo qhov interface xeev ntom ntom tseem tseem paub tseeb los ntawm qhov tseeb tias anneal hauv N2roj ua haujlwm tau zoo, tsis muaj tus tsim cov roj anneal yuav tsum tau. Lub sijhawm tiv thaiv ntawm cov kauj ruam annealing tuaj yeem luv li 1 min. los muab cov qib zoo tshaj plaws ntawm qhov chaw passivation. Cov Al2O3kuj tseem ruaj khov thaum lub sijhawm tua hluav taws raws li siv nyob rau hauv hom kev lag luam hnub ci hlwb nrog tshuaj ntsuam luam tawm kab. Qib ntawm kev hla dhau txawm li cas los xij thaum lub sij hawm no kub theem (feem ntau 800 - 900oC rau ob peb lub vib nas this) [28,29] tab sis qib seem ntawm passivation yog deb txaus rau cov muaj hom hnub ci hlwb. Cov Al2O3yog tseem pom sib xws nroga-SiNx: H hauv pawg kab thiab txawm tias kev txhim kho thermal ruaj khov tau tshaj tawm [30]. Tsis tas li ntawd stacks ntawm Al2O3nrog tsawg-kub-synthesized SiO2tau pom tias raug rho tawm haujlwm ruaj khov [20].
Npaum thim rov qab tshaj tawm Seff, maxrau ntshav-pabcuam thiab thermal ALD Al2O3films tom qab annealing ntawm qhov kub thiab txias hauv N2rau 10 min. Cov ntaub ntawv yog muab rau p- thiab n-hom Si. Cov ntaub ntawv ntawm 200oC kev txhawj xeeb raws li cov ntawv tso nyiaj ua yeeb yaj kiab (qhov kev faib tawm qhov kub siab yog 200oC rau txhua zaj duab xis)[27].
Ceeb toom 2018:Hauv PERC, kev sib tshooj ntawm Al2O3/ a-SiNx: H yog siv thiab cov tshooj no tso cai rau thinner Al2O3movies. Lub thickness ntawm Al2O3hauv PERC yog 4-10 nm.
7) - Yog txoj hauv kev rau deposition Al2O3nti tau?
Cov txheej txheem kev tso cai los ntawm PECVD [13,31] thiab qhov sib cav [14,32] yog qhov ntsuas tau thiab lawv twb tau siv hauv c-Si hnub ci kev tsim hluav taws xob. Lub tuam txhab Roth& Rau tau yoog lawv cov txheej txheem PECVD microwave rau Al2O3kev tshaj xo thiab kev txheeb tau zoo tau muab tshaj tawm [13]. Kev sib tw ntawm cov thev naus laus zis no yog tias PECVD cov tshuab uas twb muaj lawm tuaj yeem hloov kho tau yooj yim zam kev zam kev nqis peev ntau hauv kev tsim cov thev naus laus zis tshiab thiab / lossis txo kev siv peev ntau. Rau kev hais lus tsis meej txog cov txiaj ntsig passivation tau hais txog tam sim no tsis zoo npaum li rau PECVD thiab ALD txawm hais tias lawv yuav muaj peev xwm txaus rau kev lag luam tawm xov tooj ntawm tes hnub ci.
Paaj ALD tsis zoo rau kev lag luam siab ntawm cov hnub ci kev tsim tawm. Kev sib kis tau txawm li cas los tau nce los ntawm kev mus ua batch ua nyob rau hauv uas ntau (100+) wafers yog coated ib zaug hauv ib zaug xwb reactor chamber. Cov kab ke no tau ua raws los ntawm cov tuam txhab Beneq [33,34] thiab ASM [35] Lwm txoj hauv kev tau ua los ntawm ob lub tuam txhab Dutch. Ob leeg Levitech [36-38] thiab SolayTec [39-41] tau tsim cov cuab yeej sib tw-ALD nyob rau hauv uas ALD cov voj voog tsis tau nqa tawm hauv lub sijhawm sijhawm tab sis nyob hauv thaj chaw sib dhos. Qhov no yuav tsum tso cai rau kev tshaj lij siab tshaj li ntawm ntau dua 3,000 wafers ib teev rau ib qho cuab yeej.
Kev sib piv ntawm c-Si passivation cov txiaj ntsig rau qhov sib thooj-ALD, PECVD thiab kev nplawm[42]Cov. ALD ib txwm yoog qhov kev ua tau zoo tshaj plaws txawm hais tias PECVD los txog ze heev[8,43].
Ceeb toom 2018:Hauv xyoo 2011, Roth& Rau kis tau los ntawm Meyer Burger thiab qhov no yog lub npe tam sim no ntawm lub tuam txhab. Hauv ob peb xyoos dhau los, ntau yam tau tshwm sim hauv thaj teb Al2O3kev tso nyiaj thiab tuam txhab uas muag muab cov cuab yeej. Saib cov blog qab.
8) - Spatial-ALD rau kev tsim ntim ntau, cov txiaj ntsig yog dab tsi?
Ob qhov txiaj ntsig tseem ceeb tshaj plaws ntawm qhov chaw teev-ALD yog tias nws tso cai rau inline atmospheric ALD kev ua thiab tias cov voj voog tsis tau nqa tawm hauv lub sijhawm sijhawm tab sis nyob hauv thaj chaw dav. Qhov kawg txhais tau hais tias kev txhaj tshuaj thawm ua ntej thiab cov tshuaj tiv thaiv tau siv qhov chaw hauv cov chaw sib txawv lossis thaj chaw uas cov pa roj theem hom raug kaw. Cov aav no tau sib cais los ntawm inert gas uas tsim los ntawm thaj chaw huv hauv. Txhawm rau kom muaj cov substrate raug nthuav tawm mus rau thaj chaw sib txawv hloov chaw, cov av thawb pob tau muab txhais los ntawm cov chaw sib txawv. Qhov kev txhais lus no tuaj yeem yog kab ncaj ncaj los ntawm kev txav mus rau txheej txheej qis dhau los ntawm ntau thaj chaw (mus kom ze los ntawm Levitech [36-38]) lossis nws tuaj yeem ua ntu zus los ntawm kev hloov cov substrates txheeb ze rau kev tso tawm lub taub hau li-thiab-tawm mus (mus kom ze ua raws li SolayTec [39 -41,44]). Lwm cov txiaj ntsig rau inline spatial ALD yog qhov tseeb hais tias ib leeg-qhov kev tso nyiaj tau yooj yim tuaj yeem ua tiav, qhov tsis muaj qhov chaw txav chaw (sib nrug ntawm kev zam), thiab qhov tseeb tias tsis muaj qhov kev tso nyiaj nyob ntawm cov khoom ntsa. Tsis tas li ntawd kev siv cov khoom siv ua ntej tau txais txiaj ntsig zoo.
The spatial ALD system “Levitrack” ntawm Levitech rau kev ua kab hauv xov tooj ntawm tes rau hnub ci ntawm lub nruab nrog siab[36-38]Cov. Cov chaw cia yog nyob ntawm cov ciav hlau thiab lawv "ntab" ntawm cov roj uas tsim los ntawm cov roj uas txhaj: Al (CH3)3txheejtxheem, N2ntxuav, H2O cov tshuaj tiv thaiv, thiab N2purge thiab lwm yam. Txoj haujlwm ntawm txoj kev tos tus kheej yog tus tswj tus kheej ib nrab nyob rau ib nrab ntawm cov ciav hlau thiab kuj yog qhov kev ncua deb ntawm kev nyob ib sab ntawm ob peb centimeters yog kev tswj tus kheej. Hauv kev teeb tsa tam sim no lub kaw lus yields ~ 1 nm Al2O3rau ib 1 m system ntev.
9) - Yuav ua li cas hais txog cov nqi ntau lawm ib wafer rau Al2O3khaubncaws sab nraud povtseg passivation?
Lo lus nug no nyuaj los teb rau lub sijhawm no. Qee cov khoom siv manufacturers Al2O3cov tshuab tso khoom tau tshaj tawm cov xees ob peb xees hauv ib wafer. Txawm li cas los xij, kev siv ntawm piv txwv sab nraub qaum-daim phiaj passivation muaj qhov cuam tshuam loj rau tag nrho cov txheej txheem ntws ntawm lub hnub ci cell chaw tsim khoom thiab tus nqi-ntawm-tswv cuab yuav yog li loj nyob ntawm seb cov ntsiab lus ntawm lub nraub qaum-daim phiaj passivation xaiv. Tsis tas li kev sib tos ntawm Al2O3nrog rau lwm cov ntaub ntawv thiab cov txheej txheem ua tiav yog qhov kev sib tw loj uas tam sim no los ntawm kev lag luam PV.
Ib qho tseem ceeb nrhiav kom deb li deb yog qhov tseeb tias kev hla ntawm hnub ci hlwb los ntawm Al2O3tsis xav tau semiconductor qib purity ntawm Al (CH3)3thawj ua ntej. Nws tau pom tias qhov kev ntsuas dhau los tau txais los ntawm hnub ci qib Al (CH3)3kuj ua tau zoo kawg nkaus [10]. Nov tsuas yog ib qho ntawm qhov tseem ceeb hais txog tus nqi uas yuav tsum tau txiav txim siab. Lwm qhov kev soj ntsuam zoo yog tias qhov kev ua tau zoo heev passivation tseem tuaj yeem ua tiav los ntawm lwm qhov, qee qhov kev pyroforic tsawg dua li Al (CH3)3, piv txwv li ALD ntawm Al2O3los ntawm Al (CH3)2(OiPr) thiab O2ntshav qhia tawm kuj zoo heev passivation kev ua tau zoo [10].
Lub neej zoo rau plasma-pabcuam thiab thermal ALD Al2O3cov tso tso nyiaj los ntawm semiconductor thiab qib kawm Al (CH3)3[10]Cov. Tus coj Seff, maxqhov muaj nuj nqis yog qis li=1-2 cm / s rau kev txhaj tshuaj ntawm 1014-1015cm-3Cov. Los ntawm daim duab no nws tuaj yeem xaus lus tias tsis tas yuav siv cov khoom siv sib txuas ua ntej kom ncav qib siab ntawm qhov chaw siab dhau
Ceeb toom 2018:Kom meej meej, kev siv ntawm Al2O3nanolayers rau passivation them tawm. Siv Al (CH3)3li ntawm tus npuaj teg yog tus nqi tseem ceeb heev yog li qhov kev siv nyiaj tau txais txiaj ntsig thiab ua haujlwm tau yooj yim yog qhov tseem ceeb.
10) - Cov kev cia siab zuag qhia tag nrho rau kev siv Al li cas2O3hauv PV?
Lo lus nug yog tej zaum tsis yog txawm Al2O3yuav siv rau hauv kev ua lag luam hnub ci hlwb tab sis thaum Al2O3yuav tau mus siv. Cov lus nug tseem yog qhov twg ntawm lub hnub ci hlwb Al2O3yuav tau mus siv. Nws yuav tsis yog nyob rau hauv siab-siab, ua haujlwm siab, monocrystalline Si hnub ci hlwb. Al2O3zaj duab xis nyias kuj yuav tau nthuav rau ntau lub hnub ci cell cell ntau lawm. Nws thiaj li tuaj yeem xaus lus tias tag nrho cov kev cia siab yog heev kaj.
Ceeb toom 2018:Al2O3nanolayers tau ua kom PERC thev naus laus zis uas tshwm sim rau kev ua lag luam nyob ib ncig ntawm 2014. Xyoo no lub ntiaj teb cov xov tooj ntawm tes 'cov khoom lag luam tuaj yeem ncav cuag li 50%.
Chiv keeb:
R. Hezelli al.,J. Electrochem. Soc136518-523 (1989)
G. Agostinellili al.,Sol. Lub Zog Hluav Taws Xob. Sol. Hlwb903438-3443 (2006)
B. Hoexli al.,Ntsuas siv. Lub Cev. Ntawv tso.89042112 (2006)
SM Georgeli al.,Chem.Rev.110111-131 (2010)
B. Hoexli al.,Ntsuas siv. Lub Cev. Ntawv tso.91112107 (2007)
J. Schmidtli al.,Prog.Photovoltaics Res. Ntsuas siv.16461-466 (2008)
J. Benickli al.,Ntsuas siv. Lub Cev. Ntawv tso.92253504 (2008)
G. Dingemansli al.,Kev Siv Hluav Taws Xob. Solid-State Lett.13H76-H79 (2010)
G. Dingemansli al.,Ntsuas siv. Lub Cev. Ntawv tso.97152106 (2010)
G. Dingemans thiab WMM Kessels,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
G. Dingemansli al.,Kev Siv Hluav Taws Xob.Solid-State Lett.14H1-H4 (2011)
S. Miyajimali al.,Ntsuas siv.Lub Cev. Nthuav qhia3012301 (2010)
P. Neeg Ntseeg-Cam Khwbli al.,IEEE electronics Device Lett.31695-697 (2010)
T.-T. Lili al.,Lub Cev.Cov xwm txheej Solidi RRL3160-162 (2009)
P. Vitanovli al.,Nyias Khoom Ua Yeeb Yaj Duab5176327-6330 (2009)
H.-Q. Xiaoli al.,Lub puab tsaig. Lub Cev.Ntawv tso.26088102 (2009)
DH Levyli al.,J. Disp. Technol.5484-494 (2009)
B. Hoexli al.,J. Appl. Lub Cev.104113703 (2008)
NM Terlindenli al.,Ntsuas siv.Lub Cev. Ntawv tso.96112101 (2010)
G. Dingemansli al.,Lub Cev. Cov xwm txheej Solidi RRL522-24 (2011)
Tshav& Cua Zog, Kaum Ib Hlis (2010)
Photon Thoob Ntiaj Teb, Lub Peb Hlis (2011)
J. Benickli al.,35. IEEE Photovoltaic Cov Kws Tshaj Lij Sib Tham, Honolulu (2010)
WC Hnubli al.,Kev Siv Hluav Taws Xob.Solid-State Lett.12H388-H391 (2009)
IG Romijnli al.,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
J. Ebserli al.,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
G. Dingemansli al.,Lub Cev.Cov xwm txheej Solidi RRL410-12 (2010)
G. Dingemansli al.,J. Appl. Lub Cev.106114907 (2009)
J. Benickli al.,Lub Cev. Cov xwm txheej Solidi RRL3233-235 (2009)
J. Schmidtli al.,Lub Cev.Cov xwm txheej Solidi RRL3287-289 (2009)
Roth& Rau,http://www.roth-rau.de
J. Liuli al.,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
JI Skarp,218th Electrochemical Lub Rooj Sib Tham, Las Vegas (2010)
Hauv qab,http://www.beneq.com
ASM,http://www.asm.com
EHA Grannemanli al.,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
VI Kuznetsovli al.,218th Electrochemical Lub Rooj Sib Tham, Las Vegas (2010)
Levitech,http://www.levitech.nl
B. Vermangli al.,Prog.Photovoltaics Res. Ntsuas siv.(2011)
P. Poodtli al.,Nub. Mais.223564-3567 (2010)
SoLayTec,http://solaytec.org
J. Schmidtli al.,25th European Photovoltaic Hnub Ci Zog Kev Sib Tham thiab Kev Ua Yeeb Yam, Valencia (2010)
P. Neeg Ntseeg-Cam Khwbli al.,Ntsuas siv. Lub Cev. Ntawv tso.95151502 (2009)
P. Poodtli al.,Lub Cev. Cov xwm txheej Solidi RRL5165-167 (2011)
